Effect of the satellite lines and opacity on the extreme ultraviolet emission from high-density Xe plasmas

Akira Sasaki; Katsunobu Nishihara; Masakatsu Murakami; Fumihiro Koike; Takashi Kagawa; Takashi Nishikawa; Kazumi Fujima; Tohru Kawamura; Hiroyuki Furukawa
December 2004
Applied Physics Letters;12/13/2004, Vol. 85 Issue 24, p5857
Academic Journal
Extreme ultraviolet (EUV) emission from Xe plasma in the λ=13.5 nm band is theoretically investigated for lithographic application. It appears that a large number of satellite lines due to the 4d–4f, 4d–5p, and 4p–4d transitions significantly contribute to the emission over the spectral range from 10 to 17 nm. At electron densities above 1020/cm3, laser-produced Xe plasmas attain quasilocal thermodynamic equilibrium (LTE) in order to make the emission intensity in the 13.5 nm band comparable to that in the 11 nm band.


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