TITLE

Characterisation of the interface of sputter-deposited copper coatings on nitrogen plasma-treated carbon substrates

AUTHOR(S)
Rosner, M; Neubauer, E; Eisenmenger-Sittner, Ch; Bangert, H; Hutter, H
PUB. DATE
November 2004
SOURCE
Analytical & Bioanalytical Chemistry;Nov2004, Vol. 380 Issue 5/6, p838
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
The adhesion of copper coatings to carbon substrates is very poor, because of lack of diffusion or reaction between the constituents. Because there is technological interest in enhancing the adhesion and improving the interface between copper and carbon, plasma treatment of the carbon substrate was employed in this study. For modification of the carbon surface a nitrogen plasma was used. It was confirmed by pull-off tests that the strength of adhesion of the copper coating can be improved by a factor of more than 10 by plasma pretreatment, even after treatment for a very short time (1 min). To obtain more information about the mechanisms of the processes occurring at the interface SIMS investigations were performed on samples which had been treated for different times (between 1 and 60 min). These measurements confirmed that nitrogen is located on the interface. With increasing pretreatment time the amount of nitrogen detected on the interface increased. Besides characterisation of as-deposited samples, another focus was to study the mechanisms of diffusion of nitrogen if the samples are heat treated at 500°C.
ACCESSION #
15205849

 

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