Fabrication of three-dimensional photonic crystal with alignment based on electron beam lithography

Subramania, G.; Lin, S. Y.
November 2004
Applied Physics Letters;11/22/2004, Vol. 85 Issue 21, p5037
Academic Journal
We demonstrate the fabrication of a three-dimensional woodpile photonic crystal in the near-infrared using a layer-by-layer approach involving electron beam lithography and spin on glass planarization. The alignment accuracy between the first and the fifth layer is within 10% of the lattice spacing as measured from cross section scanning-electron-microscopy images. Optical reflectivity measurements reveal peaks consistent with the photonic gap frequency. The method offers a way of rapid prototyping full three-dimensional photonic band gap devices with considerable flexibility of materials choice. Moreover, lattice structure that can operate at wavelengths into the visible can be fabricated using this approach.


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