TITLE

Gate-alloy-related kink effect for metamorphic high-electron-mobility transistors

AUTHOR(S)
Chen, Y. J.; Hsu, W. C.; Lee, C. S.; Wang, T. B.; Tseng, C. H.; Huang, J. C.; Huang, D. H.; Wu, C. L.
PUB. DATE
November 2004
SOURCE
Applied Physics Letters;11/22/2004, Vol. 85 Issue 21, p5087
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Gate-metal-related kink effects in InAlAs/InGaAs/GaAs metamorphic high-electron-mobility transistors have been investigated. Improvements on the kink effect have been observed by using the higher Schottky barrier height gate alloys, including Ti/Au, Ni/Au, and Pt/Au, as compared to the use of the conventional Au gate metal. In comparison with gate alloy combinations, the devices with Ti/Au alloy exhibit superior noise characteristics, whereas those with Ni/Au alloy demonstrate the highest power characteristics. With the gate dimensions of 1.2×200 μm2, the device minimum noise figure, NFmin, is 1.17 dB at 2.4 GHz by using Ti/Au and the output power is 13.14 dBm at 2.4 GHz by using Ni/Au. Significant rf characteristics have also been improved upon that with Au gate.
ACCESSION #
15155511

 

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