TITLE

Combined electron- and ion-beam imprinter and its applications

AUTHOR(S)
Ji, Q.; Ji, L.; Chen, Y.; Leung, K.-N.
PUB. DATE
November 2004
SOURCE
Applied Physics Letters;11/15/2004, Vol. 85 Issue 20, p4618
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
A combined electron- and ion-beam system employing a double-chamber plasma source and a single accelerator column has been developed to provide focused electron and positive-ion beams simultaneously, with no need for a separate electron source or accelerating column for sample neutralization. The self-aligned ion and electron beams can he used to micromachine and image a variety of materials, both conducting and insulating. Together with an ion-beam imprinting scheme, the combined electron/ion beam system is compact and provides low-cost, high-throughput, and large-area micromachining.
ACCESSION #
15075080

 

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