TITLE

Monitoring lithography product data for real-time focus control

AUTHOR(S)
Peters, Kurt M.; Creighton, Michael
PUB. DATE
November 2004
SOURCE
Microlithography World;Nov2004, Vol. 13 Issue 4, p22
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
The difference between the width of the bottom of an isolated resist line and the width of the top can be extracted from CD-SEM data and used as a focus monitor metric. This facilitates real-time on-product focus control and the prompt identification of aberration and illumination drifts without reducing throughput.
ACCESSION #
15026940

 

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