Monitoring lithography product data for real-time focus control

Peters, Kurt M.; Creighton, Michael
November 2004
Microlithography World;Nov2004, Vol. 13 Issue 4, p22
Trade Publication
The difference between the width of the bottom of an isolated resist line and the width of the top can be extracted from CD-SEM data and used as a focus monitor metric. This facilitates real-time on-product focus control and the prompt identification of aberration and illumination drifts without reducing throughput.


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