TITLE

Magnification factor should be 8x for the 45nm node

AUTHOR(S)
Takehisa, Kiwamu
PUB. DATE
November 2004
SOURCE
Microlithography World;Nov2004, Vol. 13 Issue 4, p10
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Although ArF immersion exposure tools are now widely expected to be used for the 45nm node, 4x optical masks for 45nm must meet many severe requirements, and fullfield 4x projection optics with NA > 1 may have to be catadioptric. Changing the lens reduction factor to 8x may greatly reduce costs, both for masks and optics. Although such a system would have a lower throughput, there are ways tc mitigate that impact, which would be important cnly for chips with production runs > 8000 wafers.
ACCESSION #
15026894

 

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