TITLE

The TAO of lens adjustment: Realizing pattern-specific optimization

AUTHOR(S)
Slonaker, Steve; Magoon, Holly
PUB. DATE
November 2004
SOURCE
Microlithography World;Nov2004, Vol. 13 Issue 4, p5
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Modern lithography projection lenses enable adjustment of several parameters that affect aberrations. Phase-measuring interferometers, imaging-simulation software, and accurate models of these adjustments' effects allow lenses to be optimized for imaging specific critical patterns [1]. Nikon TAO software pulls these capabilities together to create lens-specific optimization recipes for individual customer masks.
ACCESSION #
15026888

 

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