The TAO of lens adjustment: Realizing pattern-specific optimization

Slonaker, Steve; Magoon, Holly
November 2004
Microlithography World;Nov2004, Vol. 13 Issue 4, p5
Trade Publication
Modern lithography projection lenses enable adjustment of several parameters that affect aberrations. Phase-measuring interferometers, imaging-simulation software, and accurate models of these adjustments' effects allow lenses to be optimized for imaging specific critical patterns [1]. Nikon TAO software pulls these capabilities together to create lens-specific optimization recipes for individual customer masks.


Related Articles

  • The PS/PDI: A high accuracy development tool for diffraction limited short-wavelength optics. Naulleau, Patrick; Goldberg, Kenneth A.; Lee, Sang H.; Chang, Chang; Batson, Phillip; Attwood, David; Bokor, Jeffrey // AIP Conference Proceedings;2000, Vol. 507 Issue 1, p595 

    The extreme ultraviolet (EUV) phase-shifting point diffraction interferometer (PS/PDI) was developed and implemented at Lawrence Berkeley National Laboratory to meet the significant measurement challenge of characterizing EUV projection lithography optics. The PS/PDI has been in continuous use...

  • Spatial filtering of the diffractional field of a double-exposure hologram of a focused scatterer image. Part I. Gusev, V. // Russian Physics Journal;Aug2007, Vol. 50 Issue 8, p765 

    Interferometer sensitivity to a transverse or longitudinal displacement is analyzed for the case of diffusively scattering plane surface. It is shown that the sensitivity does not change when an off-axis spherical reference wave is used instead of a flat one at the stage of hologram recording....

  • Vision + Automation Products.  // Vision Systems Design;May2005, Vol. 10 Issue 5, p77 

    Features several optical products. A400 series cameras from Basler Vision Technologies; Telecentric lens from Sill Optics; RoboCAL software module from OptoMatix; ZFV sensor from Omron Electronics.

  • Superlenses to overcome the diffraction limit. Xiang Zhang; Zhaowei Liu // Nature Materials;Jun2008, Vol. 7 Issue 6, p435 

    The imaging resolution of conventional lenses is limited by diffraction. Artificially engineered metamaterials now offer the possibility of building a superlens that overcomes this limit. We review the physics of such superlenses and the theoretical and experimental progress in this rapidly...

  • Improved coatings make etalons more robust. Callahan, Glen P.; Kubacki, Emily; Abbott, Lynore // Laser Focus World;Jun2005, Vol. 41 Issue 6, p151 

    Discusses advances in etalons, Fabry-Perot interferometer that functions as an optical filter. Improved coatings for etalons; Line-narrowing of lithography sources; Importance of material selection in lithography performance.

  • Numerous ways exist to interferometrically measure aspheres. WALLACE, JOHN // Laser Focus World;Nov2015, Vol. 51 Issue 11, p41 

    The article discusses several ways to interferometrically measure aspheric optics such as a Fizeau interferometer and an optical profiler containing an interferometer. Topics include the challenge of measuring aspheric surfaces or optical components on a standard laser interferometer, the...

  • Software catalog.  // Laser Focus World;Dec2005, Vol. 41 Issue 12, p133 

    The article reviews the 2005 interferometer software catalog from the company Fisba Optik.

  • Displacement-measuring interferometers provide precise metrology. Musinski, Dan // Laser Focus World;Dec2003, Vol. 39 Issue 12, p80 

    Explores developments in displacement-measuring interferometers (DMIs). Applications for high-precision stage metrology in semiconductor metrology tools and lithography steppers for the production of integrated circuits; Classifications of DMI systems; Challenges in addressing the needs of...

  • One Giant Leap. Weaver, Bill // Scientific Computing & Instrumentation;May2005, Vol. 22 Issue 6, p12 

    The article presents information about the micrometer precision required for high-quality manufacturing of diamond tools to manufacture the ruled grating. Using the interferometer to measure the position of diamond particles accurately is the basis for a device known as a displacement measuring...


Read the Article


Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics