TITLE

Atom lithography of Fe

AUTHOR(S)
te Sligte, E.; Smeets, B.; van der Stam, K. M. R.; Herfst, R. W.; van der Straten, P.; Beijerinck, H. C. W.; van Leeuwen, K. A. H.
PUB. DATE
November 2004
SOURCE
Applied Physics Letters;11/8/2004, Vol. 85 Issue 19, p4493
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Direct write atom lithography is a technique in which nearly resonant light is used to pattern an atom beam. Nanostructures are formed when the patterned beam falls onto a substrate. We have applied this lithography scheme to a ferromagnetic element, using a 372 nm laser light standing wave to pattern a beam of iron atoms. In this proof-of-principle experiment, we have deposited a grid of 50-nm-wide lines 186 nm apart. These ultraregular, large-scale, ferromagnetic wire arrays may generate exciting new developments in the fields of spintronics and nanomagnetics.
ACCESSION #
14974937

 

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