TITLE

Spectroscopic second harmonic generation measured on plasma-deposited hydrogenated amorphous silicon thin films

AUTHOR(S)
Kessels, W.M.M.; Gielis, J.J.H.; Aarts, I.M.P.; Leewis, C.M.; van de Sanden, M.C.M.
PUB. DATE
November 2004
SOURCE
Applied Physics Letters;11/1/2004, Vol. 85 Issue 18, p4049
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Optical second harmonic generation (SHG) has been measured for plasma-deposited thin films of hydrogenated amorphous silicon (a-Si:H) at different polarization states for pump photon energies between 1.0 and 1.7 eV. Distinct resonance peaks are observed in this energy range and it is shown that the SH signal originates from an isotropic contribution at both the film-surface and substrate-interface region. The possibility that the SH signal originates from surface and interface dangling bond states of a-Si:H is discussed.
ACCESSION #
14945505

 

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