TITLE

Multiple-exposure holographic lithography with phase shift

AUTHOR(S)
Jun Hyuk Moon; Seung-Man Yang; Pine, David J.; Won-Seok Chang
PUB. DATE
November 2004
SOURCE
Applied Physics Letters;11/1/2004, Vol. 85 Issue 18, p4184
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
We demonstrated a multiple-exposure holographic lithography with phase shift. The phase shift was utilized to translate two-dimensional (2D) and three-dimensional (3D) interference patterns. The multiple exposure of the interference patterns with a controlled phase shift created partially overlapped patterns, resulting in 2D and 3D polymer lattices of shape-anisotropic atoms. This approach can be used to design directly the unit atoms in periodic patterns for tunable optical properties.
ACCESSION #
14945460

 

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