Precise formation of nanoscopic dots on polystyrene film using z-lift electrostatic lithography

Juhl, Shane; Phillips, David; Vaia, Richard A.; Lyuksyutov, Sergei F.; Paramonov, Pavel B.
October 2004
Applied Physics Letters;10/25/2004, Vol. 85 Issue 17, p3836
Academic Journal
Z-lift electrostatic lithography on thin (10–50 nm) polystyrene (PS) films is discussed. The height of nanostructures can be controlled via mechanically drawing or depressing the cantilever height (z-lift) during the application of a voltage. Since polymer is not removed or crosslinked during structure formation, the features are erasable. Various aspects such as voltage doses, film thickness, z-lift height, and rate are explored. Structure height formation relies mainly on, and is proportional, to the z-lift magnitude; however, only a narrow range of voltages yields structures for any given film thickness. Structures ranging from 0–10 nm are produced on a 40 nm thick PS film using -36 V by varying the z-lift on a 0.1–0.9 N/m cantilever from -20 nm to +400 nm.


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