TITLE

Damage profiles of ultrashallow B implants in Si and the Kinchin-Pease relationship

AUTHOR(S)
Berg, J. A. van den; Carter, G.; Armour, D. G.; Werner, M.; Goldberg, R. D.; Collart, E. J. H.; Bailey, P.; Noakes, T. C. Q.
PUB. DATE
October 2004
SOURCE
Applied Physics Letters;10/11/2004, Vol. 85 Issue 15, p3074
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Damage distributions resulting from 0.1–2 keV B+ implantation at room temperature into Si(100) to doses ranging from 1×1014 to 2×1016 cm-2 have been determined using high-depth-resolution medium-energy-ion scattering in the double alignment mode. For all B+ doses and energies investigated a 3–4 nm deep, near-surface damage peak was observed while for energies at and above 1 keV, a second damage peak developed beyond the mean projected B+ ion range of 5.3 nm. This dual damage peak structure is due to dynamic annealing processes. For the near-surface peak it is observed that, at the lowest implant energies and doses used, for which recombination processes are suppressed due to the proximity of the surface capturing interstitials, the value of the damage production yield for low-mass B+ ions is equal or greater than the modified Kinchin-Pease model predictions [G. H. Kinchin and R. S. Pease, Rep. Prog. Phys. 18, 1 (1955); G. H. Kinchin and R. S. Pease, J. Nucl. Energy 1, 200 (1955); P. Sigmund, Appl. Phys. Lett. 14, 114 (1969)].
ACCESSION #
14909510

 

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