Back-side-illuminated high-speed Ge photodetector fabricated on Si substrate using thin SiGe buffer layers

Huang, Zhihong; Oh, Jungwoo; Campbell, Joe C.
October 2004
Applied Physics Letters;10/11/2004, Vol. 85 Issue 15, p3286
Academic Journal
We report photodiodes fabricated on Ge grown on Si substrate. The Ge growth was preceded by two SixGe1-x buffer layers. Dark current as low as 1.07 μA was achieved at 10 V reverse bias for 24 μm-diam mesa devices. At 1.3 μm wavelength, the responsivity was 0.37 A/W at 0 V and 0.57 A/W when above 2 V reverse bias. The 3 dB bandwidth was 8.1 GHz at a reverse bias of 10 V.


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