TITLE

Pseudomorphic SiC alloys formed by Ge ion implantation

AUTHOR(S)
Dashiell, M. W.; Xuan, G.; Ansorge, E.; Zhang, X.; Kolodzey, J.; DeSalvo, G. C.; Gigante, J. R.; Malkowski, W. J.; Clarke, R. C.; Liu, J.; Skowronski, M.
PUB. DATE
September 2004
SOURCE
Applied Physics Letters;9/20/2004, Vol. 85 Issue 12, p2253
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Pseudomorphic-strained layers containing from 0.07–1.25 atomic % Ge were formed by ion implantation at 1000°C into 4H-SiC substrates. X-ray diffraction revealed high crystalline quality and coherent interfaces for strains up to 1.4%. Infrared reflectivity indicated a phonon mode at 948 cm-1, attributed to Ge implantation disorder. Annealing above 1250°C caused the disappearance of the 948 cm-1 disorder mode, and the strengthening of the phonon mode at 848 cm-1, associated with the 4H stacking sequence. Structural measurements of the annealed samples revealed thermally stable, coherently strained layers of the 4H polytype, without precipitation, suggesting an isoelectronic Ge alloy compatible with SiC for heterostructure strained layer engineering.
ACCESSION #
14546703

 

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