Vertically aligned carbon nanotube heterojunctions

Cassell, Alan M.; Li, Jun; Stevens, Ramsey M. D.; Koehne, Jessica E.; Delzeit, Lance; Hou Tee Ng; Qi Ye; Jie Han; Meyyappan, M.
September 2004
Applied Physics Letters;9/20/2004, Vol. 85 Issue 12, p2364
Academic Journal
The bottom-up fabrication and electrical properties of end-to-end contacted multiwalled carbon nanotube (MWCNT) heterojunctions are reported. The vertically aligned MWCNT heterojunction arrays are formed via successive plasma-enhanced chemical vapor deposition processing to achieve the layered junction architecture. Electron microscopy and current-sensing atomic force microscopy are used to reveal the physical nature of the junctions. Symmetric, nonlinear I-V curves of the as-fabricated junctions indicate that a tunnel barrier is formed between the end-to-end contacted MWCNTs. Repeated high bias I-V scans of many devices connected in parallel fuses the heterojunctions, as manifested by a shift to linear I-V characteristics.


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