Rapid flash patterning of nanostructures

Hyunsik Yoon; Kyoung Mi Lee; Dahl-Young Khang; Lee, Hong H.; Se-Jin Choi
September 2004
Applied Physics Letters;9/6/2004, Vol. 85 Issue 10, p1793
Academic Journal
Sub-100 nm structures can be fabricated in tens of seconds with an aspect ratio much larger than unity by the general purpose patterning method presented here. A flexible film mold and a rapid flash heating with an infrared lamp are used in this nonphotolithographic patterning technique. Unlike other unconventional methods, the substrate surface can be made exposed and the resulting pattern height is sufficiently high for subsequent etching of the substrate.


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