Stylus nanoprofilometry for mask metrology

Moloni, Katerina; Morrison, Troy
August 2004
Microlithography World;Aug2004, Vol. 13 Issue 3, p18
Trade Publication
Examines the characterization of three-dimensional structures of advanced reticles using a stylus nanoprofilometer (SNP) photomask metrology. Way of extending the capability of lithography steppers; Background on SNP; Requirements for measuring critical dimensions. INSET: Extracting profile and linewidth data from raw scan data.


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