The flight of the scanner slit

Zavecz, Terrence; Reynolds, Patrick; Sager, Craig; Vellaniki, Venu
August 2004
Microlithography World;Aug2004, Vol. 13 Issue 3, p12
Trade Publication
Examines the combination of the phase-shift focus monitor (PSFM) and phase grating monitors with the Weir PSFM software. Way of illustrating the ability of the PSFM reticle to resolve errors in focus; Comparison between the behavior of rows seen on wafer edges; Link between localized focus changes and wafer backside contaminants.


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