TITLE

The flight of the scanner slit

AUTHOR(S)
Zavecz, Terrence; Reynolds, Patrick; Sager, Craig; Vellaniki, Venu
PUB. DATE
August 2004
SOURCE
Microlithography World;Aug2004, Vol. 13 Issue 3, p12
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Examines the combination of the phase-shift focus monitor (PSFM) and phase grating monitors with the Weir PSFM software. Way of illustrating the ability of the PSFM reticle to resolve errors in focus; Comparison between the behavior of rows seen on wafer edges; Link between localized focus changes and wafer backside contaminants.
ACCESSION #
14173841

 

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