TITLE

The impact of phase errors on phase-shifting masks, part 3

AUTHOR(S)
Mack, Chris A.
PUB. DATE
August 2004
SOURCE
Microlithography World;Aug2004, Vol. 13 Issue 3, p8
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Examines the impact of phase errors on the printing of alternating phase-shifting masks (PSM). Factors that contributed to the phase difference between the diffraction orders; Way of multiplying the focus shift of full image simulations; Comparison between attenuated PSM and alternating PSM.
ACCESSION #
14173821

 

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