TITLE

Modeling of immersion lithography for OPC

AUTHOR(S)
Adam, Konstantinos
PUB. DATE
August 2004
SOURCE
Microlithography World;Aug2004, Vol. 13 Issue 3, p4
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Examines advanced models of liquid immersion optics which show improvements in depth-of-focus (DOF), as of August 2004. Way of analyzing wafer-stage and reticle-scan induced errors; Impact of source polarization on images, optical proximity and linearity curves; Factors that affect the process DOF.
ACCESSION #
14173810

 

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