Quartz micromachining using laser plasma soft x rays and ultraviolet laser light

Makimura, Tetsuya; Mitani, Shinjo; Kenmotsu, Youichi; Murakami, Kouichi; Mori, Michiaki; Kondo, Kiminori
August 2004
Applied Physics Letters;8/16/2004, Vol. 85 Issue 7, p1274
Academic Journal
We have investigated a technique for micromachining inorganic transparent materials. In the technique, patterning and coloration are performed by the direct irradiation of materials with pulsed laser soft x rays and the patterned areas are ablated using ultraviolet laser light. The technique utilizes the high precision of the soft x rays and the high energy density of conventional laser light. For demonstration, we irradiated quartz plates with Ta laser plasma soft x rays. This results in generation of transient surface opaque layers that absorb more than 40% of the 266 nm Nd:YAG laser light. Applying the technique, quartz plates are found to be ablated smoothly at 85 nm/shots.


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