TITLE

Structure formation upon reactive direct current magnetron sputtering of transition metal oxide films

AUTHOR(S)
Ngaruiya, J. M.; Kappertz, O.; Mohamed, S. H.; Wuttig, M.
PUB. DATE
August 2004
SOURCE
Applied Physics Letters;8/2/2004, Vol. 85 Issue 5, p748
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
A comparative study of reactive direct current magnetron sputtering for different transition metal oxides reveals crystalline films at room temperature for group 4 and amorphous films for groups 5 and 6. This observation cannot be explained by the known growth laws and is attributed to the impact of energetic particles, originating from the oxidized target, on the growing film. This scenario is supported by measured target characteristics, the evolution of deposition stress of the films, and the observed backsputtering.
ACCESSION #
13926108

 

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