Material modifications induced by laser annealing in two-dimensional structures

La Magna, Antonio; Alippi, Paola; Privitera, Vittorio; Scalese, Silvia; Fortunato, Guglielmo; Mariucci, Luigi; Camalleri, Marco
June 2004
Applied Physics Letters;6/7/2004, Vol. 84 Issue 23, p4738
Academic Journal
The effects of the laser irradiation on metal-oxide-semiconductor structures are investigated by means of a phase-field methodology. We numerically solved the model equations in one- and two-dimensional structures also containing SiO2/amorphous-Si/crystalline-Si stacks. The simulated laser annealing processes are discussed in detail, pointing out the influence of the geometrical constraints on the irradiation effects in the samples. The simulation results are compared with the experimental two-dimensional delineation of dopant profiles. These comparisons show the importance of the joint theoretical and experimental investigations in order to fully understand the phenomena occurring in submicron sized laser irradiated structures. © 2004 American Institute of Physics.


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