May 2004
Microlithography World;May2004, Vol. 13 Issue 2, p26
Trade Publication
Presents updates on products and companies in the U.S. semiconductor industry as of May 2004. Function of the Model 5200 PanelPrinter photolithography system from Azores Corp.; Details of an expanded photoresist-stripper recovery program introduced by Mallinckrodt Baker Inc.; Microfabrication equipment provided by Intelligent Micro Patterning LLC to the University of North Carolina School of Medicine.


Related Articles

  • Resist strip for aluminum processes.  // Solid State Technology;May2006, Vol. 49 Issue 5, p62 

    The article evaluates Mallinckrodt Baker Inc.'s BAKER ALEG-380 photoresist stripper and residue remover for the semiconductor industry.

  • Maskless lithography systems enhances bio-nano research.  // Laser Focus World;Oct2004, Vol. 40 Issue 10, p61 

    Reports that an SF-100 maskless photolithography system from Intelligent Micro Patterning LLC has been installed at Arizona State University's Center for BioOptical Nanotechnology in the Biodesign Institute. Use of the Smart Filter technology; Application of the system in the fabrication of DNA,...

  • Auto stage system.  // Laser Focus World;May2006, Vol. 42 Issue 5, p157 

    The article evaluates the SF-100 Auto State photolithography system developed by Intelligent Micro Patterning LLC and offers information on the technology to protect master images and handling for automated printing of large area devices.

  • Double oxide deposition and etching nanolithography for wafer-scale nanopatterning with high-aspect-ratio using photolithography. Seo, Jungho; Cho, Hanchul; Lee, Ju-kyung; Lee, Jinyoung; Busnaina, Ahmed; Lee, HeaYeon // Applied Physics Letters;7/15/2013, Vol. 103 Issue 3, p033105 

    We report a nanolithography technique for the high aspect-ratio nanostructure manufacturing using DODE (double oxide deposition and etching) process. Conventional microfabrication processes are integrated to manufacture nanostructure arrays with sub-100 nm of linewidth. This lithography method...

  • Photolithography stepper stores up to 60 reticles.  // Solid State Technology;Apr2008, Vol. 51 Issue 4, p50 

    The article evaluates the model 9200 PanelPrinter system from Azores Corp.

  • Sequential shrink photolithography for plastic microlens arrays. Dyer, David; Shreim, Samir; Jayadev, Shreshta; Lew, Valerie; Botvinick, Elliot; Khine, Michelle // Applied Physics Letters;7/18/2011, Vol. 99 Issue 3, p034102 

    Endeavoring to push the boundaries of microfabrication with shrinkable polymers, we have developed a sequential shrink photolithography process. We demonstrate the utility of this approach by rapidly fabricating plastic microlens arrays. First, we create a mask out of the children's toy Shrinky...

  • MALLINCKRODT BAKER BUYS DISTRIBUTOR, PLANS LOCAL PRODUCTION. Hunter, David // Chemical Week;4/18/2001, Vol. 163 Issue 16, p25 

    Reports that Mallinckrodt Baker has acquired the company Machwolk and plans to manufacture photoresist strippers in Malaysia. Budget allotted by Mallinckrodt for the project; Significance of the acquisition to the strippers industry in Asia.

  • Optimized dispense recipes and 20nm filtration for reducing resist defects. Phong Do; Pender, Joe; Lehmann, Thomas; Gotlinsky, Barry; Mesawich, Michael // Solid State Technology;Jun2004, Vol. 47 Issue 6, p73 

    Discusses point-of-use chemical filtration for 193-nanometer (nm) photoresists and bottom antireflective coating formulations in semiconductor manufacturing. Evidence suggesting that 20nm filtration can significantly reduce defects in 193-nm lithography; Conventional procedure for construction...

  • PHOTORESISTS: Shaping the Future of Electronics Technology. Challener, Cynthia // JCT CoatingsTech;Jun2006, Vol. 3 Issue 6, p54 

    The article focuses on the role of photoresists in the advancement of the electronics industry. The advancement of the semiconductor technology is directly related to the ability of photoresist companies to develop products that can be used to pattern circuits on silicon wafers at smaller...


Read the Article


Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics