Resist patten collapse prevention for the sub-90nm node

Kitano, Junichi; Honma, Mitsutake
May 2004
Microlithography World;May2004, Vol. 13 Issue 2, p18
Trade Publication
Presents information on finishing-up by improved rinse materials (FIRM), a process for reducing pattern collapse. Strategies for reducing the surface tension of the rinse solution; Steps for FIRM treatment; Effect of FIRM treatment on the etching process.


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