Low-Power RF Plasma Sources for Technological Applications: I. Plasma Sources without a Magnetic Field

Vavilin, K. V.; Rukhadze, A. A.; Ri, M. Kh.; Plaksin, V. Yu.
May 2004
Technical Physics;May2004, Vol. 49 Issue 5, p565
Academic Journal
A general analytical theory is developed and numerical simulations are carried out of cylindrical plasma sources operating at an industrial frequency of f = 13.56 MHz (ω = 8.52×107s–1). Purely inductive surface exciters of electromagnetic fields (exciting antennas) are considered; the exciters are positioned either at the side surface of the cylinder or at one of its end surfaces. In the latter case, the plasma flows out of the source through the opposite end of the cylinder. A study is made of both elongated systems in which the length L of the cylinder exceeds its diameter 2R and planar disk-shaped systems with L < 2R. The electromagnetic fields excited by the antenna in the plasma of the source are determined, and the equivalent plasma resistance, as well as the equivalent rf power deposited in the plasma, is calculated. © 2004 MAIK “Nauka / Interperiodica”.


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