Reduced dielectric dispersion in ferroelectric (Pb,La)TiO3/(Pb,Ca)TiO3 thin-film multilayer heterostructures due to a mechanical stress relaxation mechanism

Poyato, Rosalía; Calzada, M. Lourdes; Pardo, Lorena
May 2004
Applied Physics Letters;5/24/2004, Vol. 84 Issue 21, p4161
Academic Journal
The dielectric dispersion of (Pb,Ca)TiO3/(Pb,La)TiO3/(Pb,Ca)TiO3 and (Pb,La)TiO3/(Pb,Ca)TiO3/(Pb,La)TiO3 ferroelectric thin-film multilayer heterostructures onto Si-based substrates has been studied and compared with that of identically prepared (Pb,La)TiO3 and (Pb,Ca)TiO3 films. Grazing incidence x-ray diffraction analysis reveals that the tetragonal distortion of the heterostructures is higher than the ones for the single-component films, which evidences a mechanical stress relaxation mechanism in the heterostructures. A lower dielectric dispersion has been obtained in the heterostructures with respect to the single-component films. This is also a consequence of the stress relaxation by plastic deformation through vacancy diffusion present in the former. Vacancy diffusion decreases the number of VPb–VO defect-dipoles, which could contribute to the dielectric permittivity at low frequencies in the heterostructures. © 2004 American Institute of Physics.


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