TITLE

Effects of dopant concentration, crystallographic orientation, and crystal morphology on

AUTHOR(S)
Miller, John B.; Brandes, George R.
PUB. DATE
November 1997
SOURCE
Journal of Applied Physics;11/1/1997, Vol. 82 Issue 9, p4538
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Describes the measurement of secondary electron emission properties from crystalline and polycrystalline diamond films containing different boron concentrations. Independence of yield from incident beam angle and crystallographic orientation; Decrease of secondary electron yield with prolonged electron beam bombardment.
ACCESSION #
13002

 

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