Dense arrays of nanopores as x-ray lithography masks

Knaack, S.A.; Eddington, J.; Leonard, Q.; Cerrina, F.; Onellion, M.
April 2004
Applied Physics Letters;4/26/2004, Vol. 84 Issue 17, p3388
Academic Journal
An anodized aluminum oxide nanopore has been used as an x-ray lithography mask to achieve a feature size of ∼35 nm on the polymethylmethacrylate photoresist. The mask was exposed using synchrotron radiation and demonstrates the feasibility of forming large arrays of regular nanostructures. © 2004 American Institute of Physics.


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