Polymer gratings with low surface relief based on photopolymerization-induced internal diffusion

Zhou, Jinbo; Changzheng Sun, Jinbo; Bing Xiong, Jinbo; Jian Wang; Yi Luo
April 2004
Applied Physics Letters;4/19/2004, Vol. 84 Issue 16, p3019
Academic Journal
A photopolymer formulation sensitive to 325 nm ultraviolet light is proposed for the fabrication of polymer gratings based on photopolymerization-induced internal diffusion process. A very low surface relief depth ranging from 12.4 to about 1.0 nm has been demonstrated with a refractive index modulation Δn of about 0.010. Such polymer gratings show promising potentials for the fabrication of low-order distributed feedback polymer lasers. © 2004 American Institute of Physics.


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