TITLE

Massively parallel, large-area maskless lithography

AUTHOR(S)
Klosner, Marc; Jain, Kanti
PUB. DATE
April 2004
SOURCE
Applied Physics Letters;4/12/2004, Vol. 84 Issue 15, p2880
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
We have developed a high-throughput scanning maskless lithography technology for patterning high-resolution features on large-area substrates. This technology, which features a spatial light modulator array and a seamless-stitching scanning technique, was used to perform imaging exposures at micron-level resolution, patterning seamlessly over exposure areas significantly larger than the field size of the projection lens. This technology is attractive for a variety of applications that currently rely on mask-based lithographic processes. © 2004 American Institute of Physics.
ACCESSION #
12754105

 

Related Articles

  • The Political Economy of Art Production during the July Monarchy. Rosen, Jeff // Art Journal;Mar1989, Vol. 48 Issue 1, p40 

    Focuses on emergence of lithography as an industrial means of producing graphic art in nineteenth-century France. Unclear relationship between the printer and the distributor of prints; Growth in number and economic importance of lithographic printshops during the July Monarchy; Factors that...

  • Printing by Lithography. LATIMER, H. C. // American Artist;Oct1952, Vol. 16 Issue 8, p47 

    The article provides information on printing through lithography. An entire range of book and cover papers is covered by lithographic papers, which are surface-sized like the regular text and bond papers. A diagram on how an offset-lithographic press works is presented, wherein the process runs...

  • Double patterning lithography for DRAM. Seo-Min Kim; Sun-Young Koo; Chang-Moon Lim // Microlithography World;Aug2007, Vol. 16 Issue 3, p4 

    The article examines double patterning lithography (DPL) for DRAM layout. DPL is performed using two cycles of lithography and etching processes. It notes that the cell patterns in DRAM are characterized by island patterns, dense contact holes and dense line patterns. The positive tone and the...

  • The impact of laser spectrum on lithography. Inoue, Hirotoshi; Enami, Tatsuo; Takahisa, Kenji // Microlithography World;Nov2006, Vol. 15 Issue 4, p4 

    The article discusses the impact of laser spectrum on lithography. It offers information on which parameter of the spectrum is most important for lithography and how variations of its width can be minimized. The author notes that the width and stability of the laser spectrum affect critical...

  • Pattern collapse. Mack, Chris A. // Microlithography World;Nov2006, Vol. 15 Issue 4, p16 

    The article focuses on pattern collapse in lithography. Pattern collapse occurs for tall, narrow resist lines when some force pushing against the top of the line causes the profile to bend or peal off the substrate. The force that pushes the line comes from the surface face tension of the...

  • Conductivity-based contact sensing for probe arrays in dip-pen nanolithography. Zou, Jun; Bullen, David; Wang, Xuefeng; Liu, Chang; Mirkin, Chad A. // Applied Physics Letters;7/21/2003, Vol. 83 Issue 3, p581 

    This letter reports a contact sensing method for dip-pen nanolithography which functions by monitoring the conductivity between the lithography probe and the substrate. Experimental results show that this method has high sensitivity and is suitable for dip-pen nanolithography applications with...

  • Print Primer.  // Better Homes & Gardens;Nov1984, Vol. 62 Issue 11, p120 

    The article discusses about original prints or graphics, which can be created in various art styles and techniques. It cites the types of original prints, including the intaglio (etchings), lithographs (chemical printing), and serigraphs. The various sources for affordable prints, particularly...

  • Lithographers Identify Maskless Challenges.  // Electronic News;1/24/2005, Vol. 51 Issue 4, pN.PAG 

    Focuses on the challenges facing maskless lithography technology developers in 2005. Overview of the traditional optical lithography process; Cost considerations; Technical factors affecting the technology's development.

  • PERFECTING. Rockley, Matt // PrintWeek (Haymarket Business Publications Ltd);10/2/2009, p38 

    The article describes some techniques of perfecting, which is the printing of both sides of a sheet in a single pass thereby eliminating the need to turn the sheet in order to print the reverse. In web-offset printing, perfecting is achieved by blanket-to-blanket print methods using sheetfed...

Share

Read the Article

Courtesy of VIRGINIA BEACH PUBLIC LIBRARY AND SYSTEM

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics