TITLE

Relaxation of nanopatterns on Nb-doped SrTiO3 surface

AUTHOR(S)
Li, Run-Wei; Kanki, Teruo; Hirooka, Motoyuki; Takagi, Akihiko; Matsumoto, Takuya; Tanaka, Hidekazu; Kawai, Tomoji
PUB. DATE
April 2004
SOURCE
Applied Physics Letters;4/5/2004, Vol. 84 Issue 14, p2670
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
By atomic force microscopy (AFM), we have realized nanolithography and changed the physical properties within a desired nanosized region on Nb-doped SrTiO3 single-crystal substrate. Importantly, a considerable relaxation of these written patterns was observed directly, which evidently indicates that a significant chemical transport occurs during and after the AFM lithography. Furthermore, we found that defects introduced by Ar bombardment can stabilize these patterns, which is quite effective for the application of AFM lithography in perovskite oxides. © 2004 American Institute of Physics.
ACCESSION #
12715432

 

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