CD Metrology Has Its Work Cut Out

Chappell, Jeff
March 2004
Electronic News;3/8/2004, Vol. 50 Issue 10, pN.PAG
Trade Publication
Focuses on a keynote address which dealt with inline optical technology and offline scanning electron microscope metrology technology delivered by Harry J. Levinson of Advanced Micro Devices at the SPIE Microlithography Conference. Information on critical dimension measurement; Benefits of the adoption of scatterometry to the industry; Importance of the microlithography conference to metrology vendors like Applied and KLA.


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