High-resolution strain measurement in shallow trench isolation structures using dynamic electron diffraction

Kim, Miyoung; Zuo, J. M.; Park, Gyeong-Su
March 2004
Applied Physics Letters;3/22/2004, Vol. 84 Issue 12, p2181
Academic Journal
We report a versatile electron diffraction strain measurement technique and its application to strain in shallow trench isolation (STI) device structures. Using a nanometer-sized probe formed by convergent-beam electrons in a field-emission transmission electron microscope, electron diffraction patterns were recorded with high spatial resolution. By fitting the diffraction patterns with a pattern matching technique using dynamic theory, it is shown that strain in the device can be measured with high accuracy to quantify the effects of different filling materials in STI structures. © 2004 American Institute of Physics.


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