TITLE

Reduction of positional errors in a four-point probe resistance measurement

AUTHOR(S)
Woriedge, D. C.
PUB. DATE
March 2004
SOURCE
Applied Physics Letters;3/8/2004, Vol. 84 Issue 10, p1695
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
A method for reducing resistance errors due to inaccuracy in the positions of the probes in a collinear four-point probe resistance measurement of a thin film is presented. By using a linear combination of two measurements which differ by interchange of the I- and V- leads, positional errors can be eliminated to first order. Experimental data measured using microprobes show a substantial reduction in absolute error from 3.4% down to 0.01%–0.1%, and an improvement in precision by a factor of 2–4. The application of this technique to the current-in-plane tunneling method to measure electrical properties of unpatterned magnetic tunnel junction wafers is discussed. © 2004 American Institute of Physics.
ACCESSION #
12405718

 

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