TITLE

Practical DUV lithography for the optoelectronics market

AUTHOR(S)
Harris, Paul D.
PUB. DATE
February 2004
SOURCE
Microlithography World;Feb2004, Vol. 13 Issue 1, p18
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Reports on the production of integrated optoelectronics devices using deep-ultraviolet (DUV) and i-line tools. Information on i-line stepper lithography; Comparison between DUV and i-line; Details of a project at Nikon Precision Europe's Advanced Lithography Centre in Livingston, Great Britain, to prove the possibility of stitching 4x DUV scanner fields to 5x i-line stepper fields.
ACCESSION #
12384081

 

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