TITLE

Photolithography microsteppers

AUTHOR(S)
Gower, Malcolm
PUB. DATE
February 2004
SOURCE
Microlithography World;Feb2004, Vol. 13 Issue 1, p16
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Reports on the purchase of an Exitech MS-13 extreme ultraviolet (EUV) microstepper for use at International Sematech's Resist Test Center. Uses of the microstepper in lithography; Features of the MS-13 EUV; Comparison between EUV and deep-ultraviolet steppers.
ACCESSION #
12384076

 

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