KLA-Tencor Upgrades Surfscan with MX 4.0

December 2003
Electronic News;12/22/2003, Vol. 49 Issue 51, pN.PAG
Trade Publication
Reports on the enhancement of the capabilities of the Surfscan defect detection tools from KLA-Tencor Corp. Improvement in both process monitoring data and benchmark defect detection; Incorporation of a software upgrade into the design of the tools; Process data that can be detected using the tools; Ability of the tools to haze data.


Related Articles

  • KLA-Tencor gets the noise out with latest plasma monitor. D. V. // Solid State Technology;Dec2008, Vol. 51 Issue 12, p17 

    The article evaluates the sensor wafer PlasmaVolt X2 from KLA-Tencor Corp.

  • Looking for Macro Defects.  // Electronic News;02/15/99, Vol. 45 Issue 2257, p26 

    Presents information on the 2401 Automated Macro Defect Inspection System from KLA-Tencor Corp. Price; Capabilities.

  • Mask defect inspection tool duel: KLAC vs. AMAT. M. D. L. // Solid State Technology;Jun2008, Vol. 51 Issue 6, p16 

    The article reports on the competition between KLA-Tencor Inc. and Applied Materials Inc. on how they will operate in identifying printable defects on the Wafer Plane Inspection (WPI) detector and Applied Aera2 aerial image inspection system. KLA-Tencor uses a numerical aperture microscope in...

  • KLA-Tencor Launches Overlay Metrology for 45nm Chips. Mutschler, Ann Steffora // Electronic News;12/11/2006, Vol. 52 Issue 50, p34 

    The article reports on the launch of the VisEdge CV300 overlay metrology system by KLA-Tencor Inc. to address the time-to-market yield challenges of 45 nanometer (nm) chip manufacturing. There are demands for an inspection technology capable of detecting the broadest range of defect types. The...

  • KLA-Tencor Discovers Fusion.  // Electronic News;4/21/2003, Vol. 49 Issue 16, pN.PAG 

    Announces the launch of the AIT Fusion UV semiconductor wafer inspection tool from KLA-Tencor. Key features; Application of double-darkfield optical inspection technology with ultraviolet illumination; Target market of the product.

  • Imaging & Detector Industry Report. Noaker, Paula M. // Laser Focus World;Feb99, Vol. 35 Issue 2, p47 

    Presents news briefs on imaging and detector industry in the United States as of February 1999. Formation of the Z/I Imaging Corp.; Acquisition of Uniphase Corp. by the KLA-Tencor Corp.; Information about Life Sciences Resources Ltd.

  • KLA-Tencor's Puma 9000 inspection tool.  // Solid State Technology;Dec2005, Vol. 48 Issue 12, p64 

    The article presents information about the new product Puma 9000 developed by the company KLA-Tencor related to defect detection in computer nodes. The Puma 9000 is designed for 90 nm nodes which can be extended to some critical etch layers through the use of streak technology. Streak technology...

  • Upgraded tool for 300mm brightfield monitoring.  // Solid State Technology;May2006, Vol. 49 Issue 5, p61 

    The article evaluates KLA-Tencor Corp.'s fifth-generation broadband UV/visible brightfield inspection system for the semiconductor industry.

  • KLA-Tencor, Clear Shape team for higher device yield at 45-nm. Taylor, Colleen // Electronic News;4/16/2007, Vol. 53 Issue 16, p43 

    The article reports on the collaboration of semiconductor manufacturing yield management and process control solutions provider KLA-Tencor Inc. with Clear Shape Technologies Inc. to work on design for manufacturability (DFM) solutions enabling design-aware photomask inspection at 45-nanometer...


Read the Article


Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics