TITLE

Surfactant Prevents 50-nm Pattern Collapse

AUTHOR(S)
Woolls-King, Andrew
PUB. DATE
December 2003
SOURCE
Electronic News;12/8/2003, Vol. 49 Issue 49, pN.PAG
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Reports on the development of a specially engineered surfactant rinse solution that will resist wafer pattern collapse by researchers from a collaboration between Tokyo Electron Ltd. (TEL) and the Japanese subsidiary of Swiss manufacturer Clariant. Test that has been made to the solution; Information on pattern collapse; Plan of TEL to market and provide rinse supply hardware and process optimization.
ACCESSION #
11904010

 

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