Parallel writing by local oxidation nanolithography with submicrometer resolution

Cavallini, Massimiliano; Mei, Paolo; Biscarini, Fabio; García, Ricardo
December 2003
Applied Physics Letters;12/22/2003, Vol. 83 Issue 25, p5286
Academic Journal
We demonstrate that the process of local oxidation of surfaces by atomic force microscopy (AFM) can be upscaled in a straightforward way by using a solid support with multiple protrusions as the cathode electrode. A metallized digital video disk DVD polymeric support has been used as a stamp to generate an array of features of variable length and 100 nm in width on a silicon surface covering a 5×6 mm[sup 2] region. The parallel patterning process involves the formation of as many liquid bridges as there are protrusions in the stamp. The growth rate of the parallel local oxides is slightly smaller than the one obtained by AFM experiments. Nonetheless, results from AFM local oxidation experiments can be readily extended to parallel oxidation which in turn opens the possibility of patterning centimeter-square regions with 10 nm motives. © 2003 American Institute of Physics.


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