Self-aligned mechanical attachment of carbon nanotubes to silicon dioxide structures by selective silicon dioxide chemical-vapor deposition

Whittaker, Jed D.; Brink, Markus; Husseini, Ghaleb A.; Linford, Matthew R.; Davis, Robert C.
December 2003
Applied Physics Letters;12/22/2003, Vol. 83 Issue 25, p5307
Academic Journal
A self-aligned thin-film deposition technique was developed to mechanically attach carbon nanotubes to surfaces for the fabrication of structurally robust nanotube-based nanomechanical devices. Single-walled carbon nanotubes were grown by thermal chemical-vapor deposition (CVD) across 150-nm-wide SiO[sub 2] trenches. The nanotubes were mechanically attached to the trench tops by selective silicon tetraacetate-based SiO[sub 2] CVD. No film was deposited on the nanotubes where they were suspended across the trenches. © 2003 American Institute of Physics.


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