Time-of-flight secondary ion mass spectroscopy for surface analysis of insulators using a cluster ion beam

Hirata, K.; Saitoh, Y.; Chiba, A.; Narumi, K.; Kobayashi, Y.; Arakawa, K.
December 2003
Applied Physics Letters;12/8/2003, Vol. 83 Issue 23, p4872
Academic Journal
An effect of the impact of cluster ions into insulating materials on charged secondary emission [K. Hirata, Y. Saitoh, K. Narumi, and Y. Kobayashi, Appl. Phys. Lett. 81, 3669 (2002)] was applied to secondary ion mass spectroscopy. Positive secondary ion time-of-flight (TOF) measurements of polycarbonate films using 0.5 MeV/atom C[sub 1][sup +] monoatomic and 0.5 MeV/atom C[sub 8][sup +] cluster ions as primary ions were performed as a function of atomic dose without charge compensation. The use of C[sub 8][sup +] instead of C[sub 1][sup +] eliminated dose-dependent peak shifts and overall spectrum compression due to charging observed with C[sub 1][sup +] bombardment. Furthermore, the C[sub 8][sup +] bombardment was found to provide better spectrum resolution than the C[sub 1][sup +] bombardment. The superior stability of the TOF spectra against charging makes mass spectrometry with cluster ion ionization a promising tool for the chemical analysis of insulating materials. © 2003 American Institute of Physics.


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