S-FIL for sub-80nm contact hole patterning

Mancini, David P.; Resnick, Douglas J.; Sreenivasan, S. V.; Watts, M.
November 2003
Microlithography World;Nov2003, Vol. 12 Issue 4, p4
Trade Publication
Demonstrates the ability of the step-and-flash imprint lithography (S-FIL) to repeatably print dense arrays of sub-80 nanometer (nm) contact holes. Background of the nanoimprint technology; Discussion of the process flow for S-FIL; Similarities of S-FIL template fabrication with the method used to manufacture phase-shift masks; Challenges of achieving sub-100nm target critical dimensions.


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