Small angle x-ray scattering for sub-100 nm pattern characterization

Jones, Ronald L.; Tengjiao Hu; Lin, Eric K.; Wen-Li Wu; Kolb, Rainer; Casa, Diego M.; Bolton, Patrick J.; Barclay, George G.
November 2003
Applied Physics Letters;11/10/2003, Vol. 83 Issue 19, p4059
Academic Journal
Characterization of sub-100 nm photolithographic patterns with nanometer scale resolution is demonstrated using small angle x-ray scattering. The transmission scattering geometry employed potentially enables high throughput measurements for future technology nodes of the semiconductor industry, organic and inorganic nanoscale devices, and three-dimensional structures. The method is demonstrated through the characterization of a series of polymer photoresist gratings using a synchrotron x-ray source. Quantities, such as periodicity and line width, are extracted using minimal modeling. Additional quantities and the potential of a laboratory-based x-ray system are briefly discussed. © 2003 American Institute of Physics.


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