Selective formation of ZnO nanodots on nanopatterned substrates by metalorganic chemical vapor deposition

Sang-Woo Kim; Kotani, Teruhisa; Ueda, Masaya; Fujita, Shizuo; Fujita, Shigeo
October 2003
Applied Physics Letters;10/27/2003, Vol. 83 Issue 17, p3593
Academic Journal
Selective formation of ZnO nanodots was accomplished by metalorganic chemical vapor deposition on nanopatterned SiO[sub 2]/Si substrates. Self-organized ZnO nanodots were selectively formed in nanopatterned lines of Si created by etching of SiO[sub 2] with focused ion beam (FIB), whereas any nanodots were hardly observed on the SiO[sub 2] surface in the vicinity of the FIB-sputtered Si areas. The mechanism of the selective formation of ZnO nanodots on FIB-nanopatterned lines is mainly attributed to the effective migration of Zn adatoms diffusing on the SiO[sub 2] surface into the Si lines followed by the nucleation at surface atomic steps and kinks created by Ga[sup +] ion sputtering. Cathodoluminescence measurements confirmed that the emission originated from the selectively grown ZnO nanodots. © 2003 American Institute of Physics.


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