TITLE

Applied Reduces Watermark Defects

PUB. DATE
October 2003
SOURCE
Electronic News;10/6/2003, Vol. 49 Issue 40, pN.PAG
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Reports on the plans of Applied Materials Inc. to integrate Marangoni Dry single-wafer vapor drying technology from SCP Global Technologies into its Applied Reflexion LK CMP system in October 2003. Functionality of single-wafer vapor drying technology; Terms of the licensing agreement between Applied and SCP; Statement issued by SCP president and CEO Mark Peterson.
ACCESSION #
11099840

 

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