Fabrication and characterization of high-quality waveguide-mode resonant optical filters

Priambodo, P. S.; Maldonado, T. A.; Magnusson, R.
October 2003
Applied Physics Letters;10/20/2003, Vol. 83 Issue 16, p3248
Academic Journal
Optical filters containing resonant waveguide gratings are designed and fabricated using low-loss, robust materials. The double-layer filters contain a silicon dioxide diffractive element on a hafnium dioxide waveguide deposited on a fused silica substrate. Noise-pattern formation is minimized by use of an antireflective absorption layer during holographic grating recording in photoresist. Subsequent fabrication steps include metallization, lift-off, and oxygen plasma etch to create a metal etch mask for final CF[sub 4] plasma etching of a surface-relief grating. Spectral characterization with a tunable laser shows that the resulting filter exhibits 90% efficiency, 1.2 nm linewidth, and low sidebands. © 2003 American Institute of Physics.


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