High-filling-fraction inverted ZnS opals fabricated by atomic layer deposition

King, J.S.; Neff, C.W.; Summers, C.J.; Park, W.; Blomquist, S.; Forsythe, E.; Morton, D.
September 2003
Applied Physics Letters;9/29/2003, Vol. 83 Issue 13, p2566
Academic Journal
The infiltration of three-dimensional opal structures has been investigated by atomic layer deposition. Demonstrations using ZnS:Mn show that filling fractions >95% can be achieved and that the infiltrated material is of high-quality crystalline material as assessed by photoluminescence measurements. These results demonstrate a flexible and practical pathway to attaining high-performance photonic crystal structures and optical microcavities. © 2003 American Institute of Physics.


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