Pattern uniformity control in room-temperature imprint lithography

Hong, Pil S.; Lee, Hong H.
September 2003
Applied Physics Letters;9/22/2003, Vol. 83 Issue 12, p2441
Academic Journal
Nonuniformity in patterning that can arise in room-temperature imprint lithography is analyzed and a condition is presented under which the uniformity is assured. The condition is developed in such a way that the elastic recovery of stain-hardened polymer after the mold is removed does not cause the nonuniformity. Experimental testing of the condition reveals that it is a reliable criterion for uniform patterning. © 2003 American Institute of Physics.


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